IISER Bhopal Researchers Pioneer Affordable Semiconductor Chip Technology
A groundbreaking development from the Indian Institute of Science Education and Research (IISER) in Bhopal promises to significantly reduce the costs associated with producing indigenous modern semiconductor chips. This innovative approach could democratize access to advanced chip fabrication, particularly benefiting educational institutions and small-scale research facilities across India.
Challenges in Traditional Chip Manufacturing
According to the research team, the conventional process of creating nanometre-to micron-scale patterns, essential for modern semiconductor chips, relies heavily on photomasks and hard masks. These methods typically necessitate the use of extremely expensive machinery, sophisticated cleanroom environments, and hazardous chemicals. The three-member research team highlighted that such resources are often beyond the reach of many researchers and colleges in India, creating a significant barrier to entry in the semiconductor field.
A Revolutionary Microfabrication Technique
Addressing these challenges, a low-cost and environmentally friendly microfabrication technique has been developed by IISER Bhopal associate professor Santanu Talukder, along with his PhD students Dr. Swapnendu Narayan Ghosh and Debjit De Sarkar. The project received partial support from the Department of Science and Technology of the Government of India and the Anusandhan National Research Foundation (ANRF).
The new technology involves utilizing a very thin layer of chromium, a material commonly employed in the semiconductor industry. By employing a sharp metal probe, researchers can precisely control a small electrochemical reaction on the chromium surface. This allows them to 'write' minuscule patterns directly onto the surface, akin to using a pen on paper.
Key Advantages and Patent Filings
Professor Talukder explained to TOI that this innovative process eliminates the need for photoresist layers, costly UV laser or electron-beam machines, and harmful chemicals. Moreover, it streamlines two critical steps in chip manufacturing: lithography and etching. The team has already filed for two patents for this technology, underscoring its potential impact.
In traditional chip fabrication, lithography is performed using high-energy ultraviolet (UV) light or electron beams, which require expensive systems and specialized setups like ultra-high vacuum environments. "In contrast, this new electric-pen–based method is much simpler and more energy-efficient," Talukder noted. "It reduces the dependency on large machines and toxic chemicals, positioning it as a greener alternative."
Implications for Education and Research
This technology holds the promise of enabling colleges, universities, and small research laboratories to design and produce their own prototype chips at a fraction of the current cost. By lowering financial and technical barriers, it could foster innovation and skill development in India's semiconductor sector, potentially accelerating the nation's progress in electronics manufacturing and research.
The development aligns with broader efforts to enhance indigenous capabilities in critical technologies, offering a sustainable and accessible solution that could reshape how semiconductor chips are fabricated in resource-constrained settings.
